C52 Double pinhole for coherence measurement
Two 200nm holes 4.0 micrometer apart.
Focus Ion Beam Milling
Date: YY/MM/DD 04/10/23
| Feature
|
Final Diameter nm | ||
| Target | Actual | ||
| Reference aperture : top 1 | ~200 | 241x271 | |
| Reference aperture : bottom 1 | 200 | 216x212 | round |
| Reference aperture : top 2 | ~200 | 288x297 | |
| Reference aperture : bottom 2 | 200 | 213x215 | round and matched with reference hole 1 |
| Center to center | 4.0 | 4.0 | |
Metal Films
| Front side (membrane side) | none |
| Back side (pit side) | Golden Gate #4 |
Membrane Specifications
| Size (micrometers) | 74x12x |
| Thickness (nm) | 100 nm |
| Frame size (mm) | 5 x 5 |
| Frame thickness (micrometers) | 200 |
Comments: This mask is intended to make a double pinhole measurement of the spatial coherence that. The geometry is similar to C49,C50 and C51.
Lab notebook Vol. 5 page 40
Milling Specifics
| Feature
|
Final Radius nm | Trial | Outer Radius | Inner Radius | Ion aperture current (pA) | Total Mill time (seconds) | Magnification | |
| Target | Actual | |||||||
| Sample Aperture | 1 | |||||||
| 2 | ||||||||
| 3 | ||||||||
| 4 | ||||||||
| 5 | ||||||||
| Broken Symmetry (square) | ||||||||
| Reference Terrace | ||||||||
| Reference aperture : top | ||||||||
| Reference aperture : bottom | ||||||||
| Center to center | ||||||||