C15
Focus Ion Beam Milling
Date: 23.01.04 and 4.02.04
Date: Remilled 6.02.04
| Feature | Radius target nm [actual] | Mill current (pA) | Mill time (seconds) | Magnification |
| Pinhole | 500 | 1 | 192 | 50kX |
| Broken Symmetry (square) | none | - | - | |
| Terrace | none | - | - | |
| Reference hole: top | 20 [] | 1 | 60 | 50kX |
| 2nd try reference hole: top | 20 [100nm] | 10 | 12 | 80kX |
| Reference hole: bottom | penetrates but size isn't clear. ~100nm | |||
| Center to center | 2500 nm | |||
Metal Films
| Front side (membrane side) | Pt(200)[Co(12)Pt(7)]_50 Pt(12) angstroms Olav's code: e4195 |
| Back side (pit side) | Cr 2nm/ Au 600nm |
Membrane Specifications
| Size (micrometers) | 200 x 200 |
| Thickness (nm) | 100 |
| Frame size (mm) | 5x5 |
| Frame thickness (micrometers) | 200 |
Comments: The pinhole for this sample was milled first, but only through the gold leaving the SiN membrane intact. Next a magnetic mulilayer was deposited over the membrane, and finally the reference hole was milled in the gold.
The reference hole for this sample was milled a second time since the first reference hole didn't penetrate the multilayer.