C39

  

Images

Focus Ion Beam Milling

Date:    YY/MM/DD    04/10/10

Feature

 

Final Diameter nm
Target Actual
Sample Aperture 5000 2100 Au milled but SiN not penetrated (see comment)
Broken Symmetry (square) none    
Reference Terrace none    
Reference aperture : top 100 129x163  
Reference aperture : bottom 200   penetration assumed no SEM characterization
Center to center 4000 4000

Metal Films

Front side (membrane side) to be deposited at Juelich
Back side (pit side) ~800nm Au See Golden Gate #2 

Membrane Specifications

Size (micrometers)  
Thickness (nm)  100 nm
Frame size (mm)  5 x 5
Frame thickness (micrometers)  200
   

Comments:  The selective etch of the Au on this sample much more difficult than normal.  As a result the nitride was penetrated in a small ~200nm area.  Not all of the Au was removed, the edges are not well defined and the no longer has a nice uniformity.   For the three hours spent on the selective etch the results were not fruitful enough to try any make any more sample.  Possible reasons that this didn't work even though it has been achieved in the past are as follows:

1) The Au deposition in the new Golden Gate chamber produced different microstructure than metallica.

2) The larger size of the hole or the increased thickness make it difficult to etch at a uniform rate over the entire structure.

3) Different FIB parameters?

See C38 for additional anlysis. 

 

 

 

Milling Specifics (  See Vol 4. page 92)

Feature

 

Final Radius   nm       Trial Outer Radius Inner Radius Ion aperture current (pA) Total Mill time (seconds) Magnification
Target  Actual
Sample Aperture     1
2
3
4
5
Broken Symmetry (square)          
Reference Terrace          
Reference aperture : top          
Reference aperture : bottom            
Center to center