C27
Focus Ion Beam Milling
Date: 02.17.04
| Feature | Radius target nm [actual] | Mill current (pA) | Mill time (seconds) | Magnification |
| Pinhole | 1000 | 11 | 285 | 65kx |
| Broken Symmetry (square) | 1.0 by 1.0 microns | 11 | 60 | 50kX |
| Terrace | 250 | 1 | 70 | 35kX |
| Reference hole: top | D= 20nm (40x 60nm) | 1 | 14 | 120kX |
| Reference hole: bottom | 58nm by 60nm | |||
| Center to center | 4 microns | |||
Metal Films
| Front side (membrane side) | |
| Back side (pit side) | 600nm of Au Metallica#3 |
Membrane Specifications
| Size (micrometers) | 200 x 200 |
| Thickness (nm) | 100 |
| Frame size (mm) | 5x5 |
| Frame thickness (micrometers) | 200 |
Comments: See page 64 of Vol. 3. The above parameters don't give the total detail for the milling technique. Further details for how each step was preformed is/will be included in the FIB guide to x-ray masks.