C21
Focus Ion Beam Milling
Date: 4.02.04
Date: Remilled 6.02.04
| Feature | Radius target nm [actual] | Mill current (pA) | Mill time (seconds) | Magnification |
| Pinhole | 750 | 1 | 280 + cleanup | |
| Broken Symmetry (square) | none | - | - | |
| Terrace | none | - | - | |
| Reference hole: top | 20 [] | 1 | 60 | 50kX |
| 2nd try reference hole: top | 20 [100nm] | 10 | 12 | 80kX |
| Reference hole: bottom | Penetration is uncertain. The hole looks small ~100nm in diameter. The contrast at 5kV would suggest penetration. | |||
| Center to center | 3000 nm | |||
Metal Films
| Front side (membrane side) | Pt(200)[Co(12)Pt(7)]_50 Pt(12) angstroms Olav's code: e4195 |
| Back side (pit side) | Cr 2nm/ Au 600nm |
Membrane Specifications
| Size (micrometers) | 200 x 200 |
| Thickness (nm) | 100 |
| Frame size (mm) | 5x5 |
| Frame thickness (micrometers) | 200 |
Comments: The magnetic multilayer and gold were deposited before the FIB was used. Both the pinhole and the reference hole were milled during the same session.
The reference hole for this sample was milled a second time since the first reference hole didn't penetrate the multilayer.