Coherent X

Coherent X-ray Scattering Masks

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Illustrations that explain terms used in the following pages

Metal Deposition Details

Gold Selective Etching

C1 (used for practice milling)

C2 (never milled)

C3 BESSY

C4 (never milled)

C5 (never milled)

C6

C7 (never milled)

C8 (never milled)

C9 BESSY

C10 (Dose array)

C11 (never milled)

C12 (never milled)

C13 (Dose array)

C14 (Selective etch rate test)

C15 (Integrated magnetic multilayer) BESSY (sent FedEx Feb. 7)

C16 (Integrated magnetic multilayer) BESSY (sent FedEx Feb. 7)

C17 BESSY (delivered by Jan)

C18 BESSY (delivered by Jan)

C19 BESSY (sent FedEx Feb. 7)

C20

C21 (Integrated magnetic multilayer) BESSY (sent FedEx Feb. 7)

C22 (USED FOR DOSE ARRAY) (Integrated magnetic multilayer)

C23 (Integrated multilayer) (similar to C21) BESSY (sent FedEx Feb. 7)

C24 (Similar to C18, but better) BESSY (sent FedEx Feb. 7)

C25 (Integrated multilayer)

C26 (Two reference holes)

C30 Coherence hole d=20 microns (Sent to BESSY August 2004)

C31 Coherence hole d=10 microns (Sent to BESSY August 2004)

C32 Coherence hole d=50 microns

C33 Coherence hole d=100 microns

C34 Coherence hole d=10 microns

C35 Coherence hole d=20 microns

C36 Dose array

C37 Dose array

C38 Selective etch test

C39 Nitride under sample hole, reference hole penetrates Au and Nitride (sent to Jülich Oct. 10, 2004)

Sample hole diameter 2000nm

C40 Both holes penetrates Au and Nitride (sent to Jülich Oct. 10, 2004)

Sample hole diameter 2000nm

C41 Both holes penetrates Au and Nitride (sent to Jülich Oct. 10, 2004)

Sample hole diameter 2000nm

C42 Both holes penetrates Au and Nitride (sent to Jülich Oct. 10, 2004)

Sample hole diameter 5000nm

C43 Both holes penetrates Au and Nitride (sent to Jülich Oct. 10, 2004)

Sample hole diameter 5000nm

C44 Selective etch

C45 Etch test

C46 e4633 Dose Array

C47 e4633a Dose Array

C48 e4633b Dose Array

C49 Reference hole penetrates Au/SiN/multilayer(e4633) (sent to BESSY Oct. 24, 2004)

C50 Reference hole penetrates Au/SiN/multilayer(e4633a) (sent to BESSY Oct. 24, 2004)

The original reference hole didn't penetrate so the redrill is on the right

C51 Reference hole penetrates Au/SiN/multilayer(e4633b) (sent to BESSY Oct. 24, 2004)

C52 Double pinhole for coherence measurement (sent to BESSY Oct. 24, 2004)

No multilayer

C53

C54 Selective etch test for new Gold Target used in Metallica #5 v5p69-91

C55 Selective etch test for new Gold Target used in Metallica #5 (Shattered Chip) v5p73-78

C56 Metallica #6 test and Rectangular aperture test for URA v5 p92

C57 Metallica #6 test for chips sent to Konstanz v5p96-100

C58 Metallica #7 Dose testing, cross sections and focus tests v6 p 4-6, 11-16

C59 Integrated Multilayer (e4645) Only one reference hole penetrated v6 p19-21

C60 Gold Coated Dust (e4656d)

C61 Integrated Multilayer (e4556d) Excellent reference holes. v6 p21-22

C62 Integrated Multilayer (e4541) Excellent round reference holes. v6 p21-22

C63 Integrated Multilayer (e4556s) v6 p32

C64 Integrated Multilayer sample e4641, but the gold didn't mill well see vol. 6 p33

C65 Integrated Multilayer sample e4556s, but the gold didn't mill well see vol. 6 p33

C66 Dose Array for Nanoparticles

C67 Sample with 110nm nanospheres see vol 6 p 57

C68 Sample with 110nm nanospheres see vol 6 p 59

C70 Dose Array for 2 micron gold for double pinholes and small squares see WFS v7p6-12

C71 Double Pinhole with 3 microns center to center see WFS v7 p13/15, RRv1p6

C72 Double Pinhole with 5 microns center to center see WFS v7 p16, RRv1p7

C73 Double Pinhole with 7 microns center to center WFS v7 p17, RRv1p8

C74 Double Pinhole with 1 microns center to center

C75 Double Pinhole with 1 microns center to center

C76 Double Pinhole with 9.8 microns center to center

C77 Double Pinhole with 19.8 microns center to center

C78 URA sample WFS V7 p27