Speaker: Regina Soufli, LLNL
Program Description
he emergence of extreme ultraviolet (EUV) and x-ray sources with unprecedented brightness and coherence properties (free-electron lasers, tabletop lasers, high-harmonic generation and synchrotron sources) has ushered a new era in scientific research and has imposed completely new demands for the performance of reflective optics needed to steer, filter and focus radiation from these sources. Such optics are also essential for other applications: solar physics and astrophysics, radiation detection and semiconductor photolithography. This presentation will discuss recent advances in the development of reflective optics for light sources in the EUV/x-ray range. The topics covered will include: 1) Corrosion-resistant, highly reflective multilayer interference coatings for the EUV range, 2) Multilayer mirrors with optimized figure and reflectivity, for the first EUV imaging systems with a numerical aperture of 0.5, aiming in the printing of 8-nm feature sizes 3) Highlights from the development, testing, long-term performance and recovery strategies of x-ray mirrors and gratings for the Linac Coherent Light Source (LCLS) free-electron laser 4) The first demonstration of multilayer mirrors in the soft gamma-ray range, at photon energies up to 0.65 MeV.
This work was performed under the auspices of the U.S. Department of Energy by Lawrence Livermore National Laboratory under Contract No. DE-AC52-07NA27344.
